Conventional EBSD can be used to characterise nanoparticles that are distributed on a silicon wafer substrate but, although the electron backscatter patterns (EBSPs) may be visible for the nanoparticles, the signal is typically masked by that from the single crystal silicon substrate. This significantly inhibits the ability to acquire statistically relevant information on grain size, distribution and internal orientation.
In this application note, a new method of sample preparation and analysis using transmission Kikuchi diffraction (TKD) is introduced for the study and classification of nanoparticles. This technique will facilitate a faster and potentially more definitive analysis tool for the field of nanoparticle metrology.
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