Ultim Extreme Infinity ∞

Start with nano to explore the infinite!

Ultim Extreme ∞ (“Infinity”) is a breakthrough solution for ultra-high resolution FEG-SEM. This unique detector enables EDS data collection at very low kV (e.g. 1-3 kV) and very short working distance to provide elemental analysis under the conditions required to analyse nanomaterials and surfaces at the highest SEM resolution. The maximum sensitivity guaranteed due to specific technological solutions such as: specially shaped sensor, windowless design, proximity of sensor to the sample, small electron trap and very high solid angle.

These solutions enable the best nano characterisation and light element detection.

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Why Infinity?

Ultim Extreme Infinity delivers solutions beyond conventional micro and nano-analysis:

  •  Infinity means guaranteed performance, tested on installation, beyond the typical specifications of any other detector including:
  •  The highest sensitivity guaranteed due to specific technological solutions such as: specially shaped sensor, windowless design, proximity of sensor to the sample, small electron trap and very high solid angle. Solid angle is 7-8× that of a typical 100mm² conventional EDS detector

✔️ Ultimate performance

The only windowless EDS detector with excellent low energy performance, resolution guaranteed at CK of 46 eV or better at all count rates up to 50,000 cps.

✔️ Excellent characterisation at high spatial resolution

Excellent low energy spectral resolution is particularly important when analysing samples using very low kV. Processing the data with TruMap can deconvolute SL/NbM and MoM overlaps.

✔️ Solving more difficult challenges using Tru-Q IQ 

New capabilities when trying to solve the most difficult overlaps or to display trace element information.

✔️ Fastest and most accurate nano-characterisation

The significant increase in the light element signal allows fast collection, and real-time data processing.

✔️ Nano resolution imaging and elemental analysis at the same conditions (WD, current, kV)


Mapping of small, low intensity features at the imaging conditions needed to see the structures.

✔️ Light element sensitivity and analysis of beam sensitive materials

Extreme Infinity measurement allows new levels of detectability for elements such as nitrogen.

Improved geometry gives better results

✔️ Nano resolution imaging and elemental analysis at same conditions (WD, current, kV)

< 3 kV, even down to 1 kV, low current (100 s pA), short WD (<5 mm, In-lens detectors for imaging).

✔️ Fastest & accurate nano-characterisation

Fast collection, real-time data processing from a bulk sample & significant signal increase from small features/low concentration phases.

✔️ Ultimate spatial resolution for SEM-EDS​

Sub – 10nm element characterisation in the FEG-SEM​.


✔️ Extreme light element sensitivity (Be-F), special cases even Li*

New levels of detectability for elements such as nitrogen and oxygen.

✔️ Surface science sensitivity

Characterise surfaces in the SEM, down to 1 kV materials characterisation & move away from TEM, or surface science tools.

✔️ Low Damage analysis

Analyse materials where beam sensitivity limits accuracy and usefulness of EDS (biological, polymers).

*Requires sample material that exhibits electron induced X-ray emission of LiK​

Why we need imaging conditions

Guaranteed performance for Nanoanalysis

Working at low accelerating voltage (kV)/ short working distance (WD)

To achieve nanometre spatial resolution on the SEM, it is necessary to use low accelerating voltage and low beam current which are ideal imaging conditions. However, that also means that the X-ray data has to be collected at the exact set of conditions. At these conditions interaction volume is small, X-ray intensity is low and another challenge is that only a few X-ray lines are being excited​.

These requirements are beyond conventional EDS capability. In order to see the smallest structure on the sample, there is a big sacrifice in the amount of X-ray signal being generated. X-ray count rates from very small structures are always very low​ and in that part of the spectrum where X-ray peaks are complex and very close together​.

Some of the main challenges of X-ray analysis at imaging conditions compared to conventional 10kV -20kV analysis are following:​

  •  Count rate ~7x lower
  •  X-ray energy ~9x lower
  •  Peak separation ~7.5 smaller

Unbeatable resolution

Interpreting low-energy X-ray data can be complex due to the closely spaced and low-intensity X-ray peaks. As a result, accurately interpreting the spectral information such as spectral overlaps and automated identification requires the highest possible spectral resolution. When analysing the low-energy portion of the spectrum, the resolution of the carbon peak (CK) is particularly important, while the manganese K (MnK) line may not even be present.

C resolution: showing importance of high energy resolution is particularly important in the low energy part of the spectrum. Higher energy resolution will result in peaks being sharper and at the correct position (no shift).

When only comparing better spectral resolution on pure standard sample (eg BN) we notice sharper peaks, but the real difference is displayed when analysing a sample. An example of different resolution can be seen in the below video, showing collected spectra. The video demonstrates how with the poor energy resolution (>60eV) S L, N K, Nb M peaks are not distinguished from the background, also Cr L line cannot be separated from the O K. However, if the detector has excellent energy resolution (<46eV) then it is possible to resolves these problematic overlaps and low intensity signals

Excellent characterisation at high spatial resolution

Excellent low energy resolution means excellent characterisation at high spatial resolution. Correct display of elemental distribution requires high spectral resolution performance. While some information displayed is similar with lower (>60 eV) and higher resolution (<46 eV) without spectrum processing (integral map), nevertheless, in some phases the concentrations are clearly different​. Processing the data with TruMap can sort out S L/Nb M and Mo M overlaps for accurate display of element variation only if the detector low energy resolution is high enough (<46eV).​

What is Tru-Q IQ​

Tru-Q™ technology revolutionised EDS when introduced with AZtec Energy all the way back in 2011. Using a fundamental EDS detector calibration measured with a synchrotron, enabled accurate characterisation of each detector type on a SEM. This characterisation Tru-Q powered EDS to reach new levels of accuracy and reliability in quantitative analysis, AutoID, peak deconvolution and real-time map correction.

Find out how Tru-Q revolutionised standardless quantitative analysis by watching our webinar: Quantitative EDS Explained: How to achieve great results

Tru-Q IQ takes things to the next level where each and every Ultim Max Infinity detector is characterised on a SEM during manufacture and then given its own unique detector optimisation. This optimisation is then confirmed during installation on your SEM. This gives unparalleled performance with every Infinity detector able to characterise accurately the most complex analysis challenges, solve challenging low energy peak overlaps and find smaller concentrations of elements.

The perfect fit to the spectrum data provided by Tru-Q IQ means minor elements like phosphorus can be identified under a complex overlap of NbL and MoL lines.​

Difficult challenges using Tru-Q IQ

The most difficult analytical challenges require Tru-Q IQ​. This next example shows semiconductor analysis at low kV conditions​. When analysing this sample with nano-metre size structures the signal from Ti is weak. Without individual detector optimisation, Ti is not recognised by autoID due to the low signal and also the overlap with NK. With individual detector characterisation and optimisation, even when analysing low intensity and overlapping peaks, such as TiL, autoID will identify the presence of this element and the correct conclusion about the existence of the TiN layer can be drawn​.

    Characterisation and optimisation

    Detector resolution is not the only parameter. Improved results can be achieved after individual detector characterisation and optimisation-unique new Tru-Q IQ. TruMap can sort out SiL/CrL/OK/MoM overlaps for accurate X-ray maps if the detector low energy resolution is high enough​. However, we can achieve even better results because after detector optimisation, improved low energy lines fitting is achieved, which gives higher auto ID confidence and consequently better display of elemental distribution. By characterising the detector and optimising the detector fitting, changes in peak shape and position are corrected. Here we see that, without detector optimisation the Mo signal is lost and the Nb/Mo overlap is not completely deconvoluted.​

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