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OmniProbe 400

A ninth generation of nanomanipulator, the OmniProbe 400 exploits innovative piezo actuation for best in class nanoscale positioning. Optimised for maximum flexibility and performance, the OmniProbe 400 is the ultimate nanomanipulator for high resolution and high throughput applications.


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A ninth generation of nanomanipulator, the OmniProbe 400 exploits innovative piezo actuation for best in class nanoscale positioning. Optimised for maximum flexibility and performance, the OmniProbe 400 is the ultimate nanomanipulator for high resolution and high throughput applications.

43 performance

Nanoscale manipulation and testing in the SEM and varied lift-out TEM sample preparations in the FIB can be performed easily while using optimized working distances

  • 4 degrees of freedom (X, Y, Z, R)
  • 4 mm or more working distance
  • 4 motion strengths: encoder resolution, motor resolution, repeatability, linearity
Accuracy

Nanometre-resolution piezo actuators and 10nm closed-loop encoders provide industry-leading precision, linearity and smooth motion

Speed

Automation on multiple levels enables results in the fewest steps possible

  • Insertion repeatability eliminates tip realignment
  • Change tips in 3 minutes without venting
  • Concentric rotation enables rapid tip sharpening, tip cleaning, and sample repositioning
  • Safely and precisely navigate to stored positions close to the sample and back to park

Accurate closed-loop feedback control

The OmniProbe 400 uses a closed-loop control to deliver smooth motion, dependable accuracy, and a high degree of integration. In addition to very high motion resolution, the OmniProbe 400 integrates motorized concentric rotation and fast in situ tip changes as standard:

  • Non-pneumatic insertion and retraction is gentle to fragile samples
  • Move with high accuracy, linearity and repeatability
  • Move diagonally in ANY direction (omnidirectionality)
  • Navigate orthogonally at any sample tilt
  • Rapidly orient samples to specific angles
  • Perform smooth and precise manipulation over long distances
  • Always know where the probe tip is, even when outside the field of view
  • Move predictably for all port installations
  • Use fixed and user-programmable positions to reduce operator fatigue and increase success rates
  • Avoid collisions
  • Rotate concentrically
  • Change tips in situ

In-situ tip change
  • Probe needles can be replaced in under 3 minutes without venting the microscope
  • Atmospheric contamination is avoided and the high vacuum preserved for the best performance
  • Samples attached to tips can be safely stored for later use, allowing multiple users to maintain their throughput

Concentric rotation

The tip stays in the field of view for rapid tip shaping and sample reorienting without risk of sample loss or accidental venting.

  • Position with sub-degree accuracy
  • Extend the needle life
  • Create fine tips exhibiting ohmic behaviour
  • Prepare micro tips for nanoparticle manipulations that use Van der Waals forces
  • Reorient samples for plan-view, side-view and backside preparations

Discover our comparison table below to help you choose the best OmniProbe for your application and to compare specifications.

SPECIFICATION                                                    OMNIPROBE
OmniProbe 350 Cryo lift-out OmniProbe 350 OmniProbe 400
Linearity 500 nm 500 nm 250 nm
Encoder resolution <50 nm <50 nm 10 nm
Insertion repeatability 15 μm* 5 μm 2 μm
Min velocity 50 nm/s 50 nm/s 10 nm/s
Max Velocity 250 μm/s 250 μm/s 500 μm/s
Compucentric rotation
Integrated temperature sensor
APPLICATION
Site specific lift-out
Plan-view P P
Vent free plan-view
Backside Thinning P
Atom Probe tomography sample preparation P P
Cryogenic liftout
Voltage contrast imaging
Charge neutralisation
On-Tip analysis
EBIC measurements O O
EBAC measurements O O
In Situ tip change O

P: Requires an OmniPivot holder O: Available as Option * at constant temperature

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OmniProbe 400

Discover why OmniProbe 400 is the ultimate nanomanipulation solution for high throughput lift-out, offering 4-axis control to simplify advanced workflows

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Application Notes

Multi-Scale Analysis of Dislocations and Grain Boundaries for Improving mc-Si Solar Cell Performance

Solar cells are being increasingly used globally and it is important that improvements are made on the production of Mc-Si cells to enhance efficiency. Analysis of these solar cells using EBIC, TEM and APT.

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